Intel Pentium D 920 BX80553920SL94S

Intel's first 65nm mobile dual core processor. This device exceeds the expectations set out in the ITRS roadmap. By reaching a smaller process node and using a dual core approach, Intel is able to produce cost effective processors for the market. Traditional transistor scaling technology follows the convention of smaller is better. TEM and SEM analysis of Intel’s 65nm Pentium D 920 dual-core processor has revealed an innovative and radical shift in Intel’s approach that shifts the focus from scaling physical dimensions towards increasing channel strain and enhancing carrier mobilities. This innovation avoids the leakage and reliability challenges involved with scaling down the gate oxide thickness or with introducing a new class of materials into the dielectric. This is the promise of strain engineering, and it is clear that strain technology is delivering on its promise at Intel.