Logic Detailed Structural Analysis of the Nokia 4377401 Baseband Processor Produced in TI 65nm Mobile Process

The Nokia 4377401 baseband processor is a custom-designed application processor using Texas Instruments (TI) IP libraries and fabricated using TI 65nm CMOS process technology. This is the first 65nm device for the wireless market and appears in the Nokia 2610 for the low price handset market.

The Nokia 4377401 baseband processor is fabricated using a six copper metal, single polycide, 65nm low stand-by power (LSTP) CMOS process with a minimum gate length of 41 nm and an SRAM cell size of 0.48µm2. The TI 65 nm process technology is reported to shrink the 90-nm design area by half, leverage strained-silicon to boost transistor performance by 40 percent, and reduce leakage power from idle transistors by a factor of 10001.

The unique process findings include:

· TI 65 nm process uses a similar transistor structure to its 90 nm process with minimum transistor gate length scaled from approximately 50 nm (OMAP1710) to approximately 40 nm;
· Nickel salicide process is used to replace cobalt salicide process;
· Optimized gate nitridation process; Available for separate purchase, SI TEM EELS analysis report compares nitrogen contents and nitrogen peak locations in both gate dielectrics;
· Transistor channels are arranged parallel to the [100] direction of a (100) silicon wafer to improve PMOS performance;
· Single stress liner (tensile) optimized to improve NMOS performance;
· 0.48 µm2 SRAM is theoretical best for 65nm keeping TI in the lead for this benchmark