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Custom Structural Analysis including TEM/EELS analysis of the Toshiba TC58NVG4D2ETA10 43nm 16G MLC NAND Flash Tunnel Oxide

This report provides quantitative EELS measurements in atomic% of O, N and Si content in the storage cell tunnel oxide, and the select transistor lower (tunnel) oxide.

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Other Custom Structural Analysis reports

Custom Structural Analysis including TEM/EELS analysis of the Toshiba TC58NVG4D2ETA10 43nm 16G MLC NAND Flash Tunnel Oxide

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